Microwave Plasma Cleaner
REFLEX Analytical introduces a technological advancement for plasma cleaning
which creates a plasma using microwave energy while enhancing the process with
temperature control between 25 and 200C. The Microwave Plasma Cleaner effectively operates by flowing a process gas such as Oxygen or Argon at a pressure from 1 to 5 torr through the process chamber and exciting the plasma discharge with microwave energy. The plasma created is an electrically neutral, highly ionized gas that flows and reacts with surface contaminants of the material being cleaned without affecting the material's underlying bulk properties, leaving the surface atomically clean.
Unlike other plasma generating methods, the design uses 2.45 GHz microwave energy and features fully adjustable power levels for duty cycle and analog power control. The analog power control is an indicator dial which permits the variation of power output from 10 to 550 Watts. The duty cycle can be programmed as continuous or provide for a flexible 30 second time interval offering cycle variation from 10 - 100% where a 50% duty cycle is 15 seconds on and 15 seconds off.
As a result of operating at higher gas pressures, higher power output and higher temperatures, you can achieve higher reaction rates never possible before.
Microwave plasma cleaning has revolutionized existing cleaning operations. The Microwave Plasma Cleaner is inexpensive, safe, simple to use and offers space saving portability. There is no waste disposal, no hazardous solvents or vapors, no isolated work areas, no sophisticated ventilation and other space consuming, capital intensive equipment; all of which contribute to the exorbitant cost of cleaning typically associated with chemical cleaning processes.
The Microwave Plasma Cleaner is available in three formats. The first offers a 4.1" diameter x 6" long Pyrex chamber, second is assembled with a 8" x 6" x 2" rectangular Pyrex chamber and the third accommodates larger components within a 9" x 7" x 3" rectangular Pyrex chamber. The rectangular units features an integrated water cooling system which permits process temperature control and enables the ability to clean a broader variety of components without the worry of heat damage. An optional water recirculating bath is available upon request.
Other options include 110V or 220V operation, vacuum pump, ion trap, and a dual gas vacuum flow controller. The Dual Gas Vacuum Flow Controller is a stand alone unit interfaced with the Microwave Plasma Cleaner and provides the ability to mix two gases if desired (such as 25% Oxygen and 75% Argon). The Controller includes power outlets for a vacuum pump and water recirculating bath, two flow meters (0 - 5 SCFM), two pressure regulators and gauges (0 - 60 psi), a vacuum pressure gauge (0 - 30" Hg), and ON/OFF rocker switches for vacuum pump, gas and vacuum control.
Select the optional Ion Trap to protect sensitive materials such as laser diode facets, photoresist or soft solder. The Ion Trap neutralizes the charged ions while allowing only neutral radicals to perform the cleaning action. The Ion Trap also serves as a Faraday cage that shields sensitive components from microwaves inside the chamber.
Contact REFLEX Analytical Corporation to discuss your application and offer request for quotation.
Unlike other plasma generating methods, the design uses 2.45 GHz microwave energy and features fully adjustable power levels for duty cycle and analog power control. The analog power control is an indicator dial which permits the variation of power output from 10 to 550 Watts. The duty cycle can be programmed as continuous or provide for a flexible 30 second time interval offering cycle variation from 10 - 100% where a 50% duty cycle is 15 seconds on and 15 seconds off.
As a result of operating at higher gas pressures, higher power output and higher temperatures, you can achieve higher reaction rates never possible before.
Microwave plasma cleaning has revolutionized existing cleaning operations. The Microwave Plasma Cleaner is inexpensive, safe, simple to use and offers space saving portability. There is no waste disposal, no hazardous solvents or vapors, no isolated work areas, no sophisticated ventilation and other space consuming, capital intensive equipment; all of which contribute to the exorbitant cost of cleaning typically associated with chemical cleaning processes.
The Microwave Plasma Cleaner is available in three formats. The first offers a 4.1" diameter x 6" long Pyrex chamber, second is assembled with a 8" x 6" x 2" rectangular Pyrex chamber and the third accommodates larger components within a 9" x 7" x 3" rectangular Pyrex chamber. The rectangular units features an integrated water cooling system which permits process temperature control and enables the ability to clean a broader variety of components without the worry of heat damage. An optional water recirculating bath is available upon request.
Other options include 110V or 220V operation, vacuum pump, ion trap, and a dual gas vacuum flow controller. The Dual Gas Vacuum Flow Controller is a stand alone unit interfaced with the Microwave Plasma Cleaner and provides the ability to mix two gases if desired (such as 25% Oxygen and 75% Argon). The Controller includes power outlets for a vacuum pump and water recirculating bath, two flow meters (0 - 5 SCFM), two pressure regulators and gauges (0 - 60 psi), a vacuum pressure gauge (0 - 30" Hg), and ON/OFF rocker switches for vacuum pump, gas and vacuum control.
Select the optional Ion Trap to protect sensitive materials such as laser diode facets, photoresist or soft solder. The Ion Trap neutralizes the charged ions while allowing only neutral radicals to perform the cleaning action. The Ion Trap also serves as a Faraday cage that shields sensitive components from microwaves inside the chamber.
Contact REFLEX Analytical Corporation to discuss your application and offer request for quotation.
